Andre Anders: h-index, Total Citations, and Citation Map
Andre Anders's h-index is 82 (324 i10-index, 27,341+ total citations across 659+ publications) according to Google Scholar as of June 2026. Andre Anders is affiliated with Plasma Engineering LLC.
Andre Anders is a researcher affiliated with Plasma Engineering LLC, specializing in Plasma Physics, Thin Films, Material Science. Their work has been cited 27,341 times. This profile visualizes their global influence, highlighting strong citation networks in India.
Andre Anders's Citation Metrics
Bibliometric impact based on 659 indexed publications.
- H-Index
- 82
- i10-Index
- 324
- Total Citations
- 27,341
- Citing Countries
- 8
As of June 2026.
Andre Anders has an h-index of 82 and 27,341 total citations across 659 publications, with research cited by institutions in 8 countries.
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We've mapped 5,000 of 27,341 citations for Andre Anders
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A structure zone diagram including plasma-based deposition and ion etching
20101,328
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Citation trend (last 10 years)Click to expand
Citation Trend (Last 10 Years)
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About Andre Anders's research
Andre Anders is a researcher in Plasma Physics, Thin Films and Material Science at Plasma Engineering LLC. Their work has been cited 27,341 times across 659 publications (h-index 82), according to Google Scholar.
Their most-cited work, “A structure zone diagram including plasma-based deposition and ion etching” (2010), has accumulated 1,328 citations. Other influential works include “Cathodic Arcs: From Fractal Spots to Energetic Condensation” (2008) with 1,224 citations and “Handbook of plasma immersion ion implantation and deposition” (2000) with 817 citations.
Citations of Andre Anders's research come primarily from India, Greece and Iraq, reflecting international research impact across 5+ countries. The interactive citation map above shows the full geographic distribution of the institutions citing this work.
